AR™ 10L is an organic, thermally cross-linking bottom anti-reflectant coating (BARC) for 248 nm (KrF) photoresists. It is designed to provide a universal anti-reflective surface for high- and low-temperature resist platforms and offers excellent compatibility with most ESCAP HYBRID and Acetal resists.
Solutions
Features & benefits
- 1st min film thickness=600A over reflective dielectrics
- Approximate optical density=9abs/um
- Compatible with common spin-coating and EBR solvents
- Conformal coating
- Fast etching rate, typically 30-40% faster than DUV series photoresists
- Universal resist compatibility
- 1st min film thickness=600A over reflective dielectrics
- Approximate optical density=9abs/um
- Compatible with common spin-coating and EBR solvents
- Conformal coating
- Fast etching rate, typically 30-40% faster than DUV series photoresists
- Universal resist compatibility
Available Sizes
| Gross Weight | Net Weight | Carton Each | Carton Length | Carton Weight | Carton Height |
|---|---|---|---|---|---|
| 757 | 0 | 0 | 0 |
Product Details
| Fabric/material | ARCS |
| Design | AR 10L-400 DUV |
| Seam | AR™ 10L-400 DUV ANTI-REFLECTANT |
| Hazard | |
| Packaging | ARCS |
| Coated Material | ARCS |
| Features | ARCS |
