The Ikonic™ 2000 series of polishing pads targets processes that require lower hardness pads. It is designed to deliver step-out improvements in wafer defect levels, consistent and stable removal rates, and longer pad lifetime.
Benefits:
- Step-out defectivity performance
- Multiple offerings to meet a range of performance requirements
- Long pad lifetime
- Easily conditioned pad surface
Applications:
- Copper barrier, buff
