PCMPSolv™ 2000 is a new series of cleans designed for cleaning semiconductor wafers after use of ceria CMP slurries required in FEOL, MEOL and memory array layers.
PCMPSolv™ 2000 is a low cost-of-ownership post-CMP cleans series featuring an acidic pH formulation for use after ceria slurries. This single chemistry solutions are designed to clean ceria slurry particles, as well as minimizing residual cerium ions post-CMP. They are designed to be used with conventional ceria slurries, as well as the newest ceria slurries, with particles either positively or negatively charged. PCMPSolv™ 2000 series offers the capability to eliminate post-CMP wet bench cleaning, such as SPM or HF.
