AR™ 137 is an organic bottom anti-reflectant coating (oBARC) for immersion lithography. It is designed to provide excellent optical parameters to minimize reflection through angles for hyper numerical aperture (NA) immersion exposure.
Features & benefits
- Excellent coating property
- Good EBR/RRC solvent compatibiliy
- Good compatibility with resist
- High etch rate
- Improves critical dimension uniformity (CDU)
- Improves etch process margin
- Improves lithographic process margins
- Optimal n&k values for hyper NA exposure
- Excellent coating property
- Good EBR/RRC solvent compatibiliy
- Good compatibility with resist
- High etch rate
- Improves critical dimension uniformity (CDU)
- Improves etch process margin
- Improves lithographic process margins
- Optimal n&k values for hyper NA exposure
Available Sizes
| Gross Weight | Net Weight | Carton Each | Carton Length | Carton Weight | Carton Height |
|---|---|---|---|---|---|
| 757 | 0 | 0 | 0 |
Product Details
| Fabric/material | ARCS |
| Design |
AR137-230 |
| Seam |
AR137-230 193nm POSITIVE PHOTORESIST |
| Packaging | ARCS |
| Hazard | |
| Coated Material | ARCS |
| Features | ARCS |
