Epic™ photoresists for ArF lithography
Epic™ photoresists are a series of resists widely used for 193 nm (ArF) processes with and without topcoats. Epic™ IM photoresists are designed for the unique environment created by immersion lithography, in which water between the lens and the wafer enables exposure of finer patterns.
Features & Benefits
- Prevents resist components that leach into water from penetrating the resist film
- Creates a barrier layer between the water and the resist, making a separate topcoat layer unnecessary, saving customers process time and money
- High resolution and defectivity photoresist used for positive tone development (PTD) or negative tone development (NTD) process applications
Applications
Epic™ photoresists are widely used for advanced nodes for logic and memory.
Featured products
- Epic™ ArF dry resist
- Epic™ IM ArF immersion resist
