Our UV™ KrF photoresists, designed for 248nm excimer laser lithography, deliver superior resolution and process reliability for advanced semiconductor manufacturing.
Features & Benefits
- Superior resolution for advanced nodes: Optimized for fine patterning in next-generation devices
- Excellent line edge roughness control: Achieve precise shapes for higher yield
- Enhanced process stability: Reliable performance in high-volume production
- Compatibility with multi-layer processes: Ideal for complex device architectures
Applications
- Advanced logic and memory device fabrication
- System large-scale integration (LSI) and system-on-chip (SoC) fabrication
- MEMS and sensor production
- Optical devices and photonics
Featured products
- UV™ 26GNF KrF photoresist
